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author:

Zhao, L. (Zhao, L..) [1] | Chen, X. (Chen, X..) [2] | Wang, X. (Wang, X..) [3] | Zhang, Y. (Zhang, Y..) [4] | Wei, W. (Wei, W..) [5] | Sun, Y. (Sun, Y..) [6] | Antonietti, M. (Antonietti, M..) [7] | Titirici, M.-M. (Titirici, M.-M..) [8]

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Abstract:

Figure Presented A C@TiO2 visible-light "dyade"-like structure, catalytically active over the whole visible-light spectrum, has been produced in a one-step low-temperature solvo-thermal process. © 2010 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

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Community:

  • [ 1 ] [Zhao, L.]Colloid Chemistry Departament, Max-Planck Institute for Colloids and Interfaces, Am Muehlenberg 1, 14424, Potsdam, Germany
  • [ 2 ] [Zhao, L.]Institute of Coal Chemistry, Chinese Academy of Sciences, Taiyuan 030001, China
  • [ 3 ] [Chen, X.]Colloid Chemistry Departament, Max-Planck Institute for Colloids and Interfaces, Am Muehlenberg 1, 14424, Potsdam, Germany
  • [ 4 ] [Chen, X.]Research Institute of Photocatalysis, Fuzhou University, Fujian 350002, China
  • [ 5 ] [Wang, X.]Colloid Chemistry Departament, Max-Planck Institute for Colloids and Interfaces, Am Muehlenberg 1, 14424, Potsdam, Germany
  • [ 6 ] [Wang, X.]Research Institute of Photocatalysis, Fuzhou University, Fujian 350002, China
  • [ 7 ] [Zhang, Y.]Colloid Chemistry Departament, Max-Planck Institute for Colloids and Interfaces, Am Muehlenberg 1, 14424, Potsdam, Germany
  • [ 8 ] [Wei, W.]Institute of Coal Chemistry, Chinese Academy of Sciences, Taiyuan 030001, China
  • [ 9 ] [Sun, Y.]Institute of Coal Chemistry, Chinese Academy of Sciences, Taiyuan 030001, China
  • [ 10 ] [Antonietti, M.]Colloid Chemistry Departament, Max-Planck Institute for Colloids and Interfaces, Am Muehlenberg 1, 14424, Potsdam, Germany
  • [ 11 ] [Titirici, M.-M.]Colloid Chemistry Departament, Max-Planck Institute for Colloids and Interfaces, Am Muehlenberg 1, 14424, Potsdam, Germany

Reprint 's Address:

  • [Zhao, L.]Colloid Chemistry Departament, Max-Planck Institute for Colloids and Interfaces, Am Muehlenberg 1, 14424, Potsdam, Germany

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Source :

Advanced Materials

ISSN: 0935-9648

Year: 2010

Issue: 30

Volume: 22

Page: 3317-3321

1 0 . 8 8

JCR@2010

2 7 . 4 0 0

JCR@2023

JCR Journal Grade:1

CAS Journal Grade:1

Cited Count:

WoS CC Cited Count: 0

SCOPUS Cited Count: 449

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 2

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