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[期刊论文]

A New One-Pot Sequential Reduction-Deposition Method for the synthesis of Silica-supported NiPt and CuPt Bimetallic Catalysts

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author:

Vargheese, V. (Vargheese, V..) [1] | Ghampson, I.T. (Ghampson, I.T..) [2] | Yun, G.-N. (Yun, G.-N..) [3] | Unfold

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Abstract:

A one-pot redox deposition method is described to prepare silica-supported bimetallic NiPt and CuPt catalysts using differences in standard reduction potentials. The synthesis involved the initial reduction of non-noble metal ions (Ni2+ and Cu2+) by NaBH4, followed by reduction of Pt ions by these reduced metals. Alloy formation and phase purity were established by X-ray diffraction (XRD), bulk composition by X-ray fluorescence (XRF), and surface composition by X-ray photoelectron spectroscopy (XPS). Alloy formation was enhanced by increase in the amount of base metals available to reduce Pt, or through the use of excess NaBH4 after redox deposition. The catalysts were evaluated for methane oxidation at 300-400 °C and atmospheric pressure. Reference samples prepared using the incipient wetness impregnation (IW) method had inferior performance and characteristics. The redox deposition method provides a simple and versatile protocol for the preparation of bimetallic alloys between noble metals and base metals. © 2019 Elsevier B.V.

Keyword:

Bimetallic catalyst; copper platinum; nickel platinum; noble metal and base metal alloy; redox deposition method; reduction potential

Community:

  • [ 1 ] [Vargheese, V.]Department of Chemical System Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo, 113-8656, Japan
  • [ 2 ] [Ghampson, I.T.]Department of Chemical System Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo, 113-8656, Japan
  • [ 3 ] [Yun, G.-N.]Department of Chemical Engineering, Virginia Tech, Blacksburg, VA 24061, United States
  • [ 4 ] [Kobayashi, Y.]Department of Chemical System Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo, 113-8656, Japan
  • [ 5 ] [Takagaki, A.]Department of Chemical System Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo, 113-8656, Japan
  • [ 6 ] [Ted Oyama, S.]Department of Chemical System Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo, 113-8656, Japan
  • [ 7 ] [Ted Oyama, S.]Department of Chemical Engineering, Virginia Tech, Blacksburg, VA 24061, United States
  • [ 8 ] [Ted Oyama, S.]School of Chemical Engineering, Fuzhou University, Fuzhou, 350116, China

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Source :

Applied Catalysis A: General

ISSN: 0926-860X

Year: 2020

Volume: 591

5 . 7 0 6

JCR@2020

4 . 7 0 0

JCR@2023

ESI HC Threshold:160

JCR Journal Grade:1

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count: 14

30 Days PV: 0

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