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[期刊论文]

The Direct Partial Oxidation of Methane to Dimethyl Ether over Pt/Y2O3 Catalysts Using an NO/O2 Shuttle

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author:

Vargheese, V. (Vargheese, V..) [1] | Kobayashi, Y. (Kobayashi, Y..) [2] | Oyama, S.T. (Oyama, S.T..) [3]

Indexed by:

Scopus

Abstract:

Using a mixture of NO + O2 as the oxidant enabled the direct selective oxidation of methane to dimethyl ether (DME) over Pt/Y2O3. The reaction was carried out in a fixed bed reactor at 0.1 MPa over a temperature range of 275–375 °C. During the activity tests, the only carbon-containing products were DME and CO2. The DME productivity (μmol gcat−1 h−1) was comparable to oxygenate productivities reported in the literature for strong oxidants (N2O, H2O2, O3). The NO + O2 mixture formed NO2, which acted as the oxygen atom carrier for the ultimate oxidant O2. During the methane partial oxidation reaction, NO and NO2 were not reduced to N2. In situ FTIR showed the formation of surface nitrate species, which are considered to be key intermediate species for the selective oxidation. © 2020 Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim

Keyword:

dimethyl ether; methane partial oxidation; NO/O2 shuttle; Pt/Y2O3

Community:

  • [ 1 ] [Vargheese, V.]Department of Chemical System Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo, 113-8656, Japan
  • [ 2 ] [Kobayashi, Y.]Interdisciplinary Research Center for Catalytic Chemistry, National Institute of Advanced Industrial Science and Technology (AIST), Central 5, Higashi 1-1-1, Tsukuba, Ibaraki 305-8565, Japan
  • [ 3 ] [Oyama, S.T.]School of Chemical Engineering, Fuzhou University, Fuzhou, 350116, China
  • [ 4 ] [Oyama, S.T.]Department of Chemical Engineering, Virginia Tech, Blacksburg, VA 24061, United States
  • [ 5 ] [Oyama, S.T.]Department of Chemical System Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo, 113-8656, Japan

Reprint 's Address:

  • [Oyama, S.T.]School of Chemical Engineering, Fuzhou University, Department of Chemical Engineering, Virginia Tech, Department of Chemical System Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, China

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Source :

Angewandte Chemie - International Edition

ISSN: 1433-7851

Year: 2020

Issue: 38

Volume: 59

Page: 16644-16650

1 5 . 3 3 6

JCR@2020

1 6 . 1 0 0

JCR@2023

ESI HC Threshold:160

JCR Journal Grade:1

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count: 数据采集中

SCOPUS Cited Count: 13

30 Days PV: 1

Affiliated Colleges:

操作日志

管理员  2023-12-12 10:30:23  更新被引

管理员  2023-12-12 10:30:19  更新被引

管理员  2020-11-19 20:54:13  创建

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