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author:

Wu, X. (Wu, X..) [1] | Liu, R. (Liu, R..) [2] | Gao, J. (Gao, J..) [3] | Luo, J. (Luo, J..) [4] | Geng, H. (Geng, H..) [5]

Indexed by:

Scopus

Abstract:

A self-made line laser liquid level measurement system was used to measure the fluctuation of molten metal free surface under pulsed magnetic field. The electromagnetic characteristics of pulsed electromagnetic force were mathematically analyzed. Results showed that the electromagnetic force presents oscillatory attenuation during a single pulse period. The electromagnetic force was composed of turning force fturn and non-turning force fnonturn The direction of fturn was always consistent with the melt circumferential direction, which turned the fnonturn consisted of electromagnetic pull and push forces, which caused the melt to oscillate. Under the pulsed magnetic field, the free surface formed a meniscus with a high middle, low side structure. With increased pulsed field intensity, the center surface of molten melt had an oscillation of 3.52 mm at 0.187 T. The wave power density had only two spectral peaks (at 0.60 and 3.36 Hz) without a magnetic field. Under pulsed magnetic field, four spectral peaks were found at 0.40, 3.00, 6.50 and 13.00 Hz. © 2020 The Author(s). Published by IOP Publishing Ltd.

Keyword:

molten metal fluctuation; pulsed electromagnetic force; pulsed magnetic field

Community:

  • [ 1 ] [Wu, X.]School of Engineering, Fujian Jiangxia University, Fuzhou, 350108, China
  • [ 2 ] [Liu, R.]Capital Aerospace Machinery Corporation Limited, Beijing, 100076, China
  • [ 3 ] [Gao, J.]School of Mechanical Engineering and Automation, Fuzhou University, Fu Zhou, 350108, China
  • [ 4 ] [Luo, J.]School of Mechanical Engineering and Automation, Fuzhou University, Fu Zhou, 350108, China
  • [ 5 ] [Geng, H.]School of Mechanical Engineering and Automation, Fuzhou University, Fu Zhou, 350108, China

Reprint 's Address:

  • [Gao, J.]School of Mechanical Engineering and Automation, Fuzhou UniversityChina

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Source :

Materials Research Express

ISSN: 2053-1591

Year: 2020

Issue: 5

Volume: 7

1 . 8 0 0

JCR@2023

ESI HC Threshold:196

JCR Journal Grade:4

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count: 1

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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