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[期刊论文]

Enhanced Performance of an Electric Double Layer Microsupercapacitor Based on Novel Carbon-Encapsulated Cu Nanowire Network Structure As the Electrode

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author:

Wang, J. (Wang, J..) [1] | Wang, X. (Wang, X..) [2] | Lee, S.W. (Lee, S.W..) [3] | Unfold

Indexed by:

Scopus

Abstract:

In this work, the performance of a novel three-dimensional carbon-based planar microsupercapacitor (MSC) electrode structure is investigated. An in situ template-free fabrication of the Cu nanowire network structure acting as the current collector is first prepared through a chemical oxidation phase of sputtered Cu films, followed by a thermal reduction phase. Carbon is subsequently grown over the Cu nanostructure. In a two-electrode electrochemical test, the patterned interdigitated carbon/Cu nanowire network device exhibits an excellent maximum areal and volumetric capacitance of 1.45 and 7.43 mF cm-3, respectively, while retaining 94.2% of its capacitance after 10 000 charge-discharge cycles. This relatively simple foundry-compatible fabrication process provides an excellent method in which planar MSCs can be patterned and fabricated for energy storage solutions in microelectronics. Copyright © 2019 American Chemical Society.

Keyword:

3-D network; carbon; CVD; energy storage; microsupercapacitor; nanowire

Community:

  • [ 1 ] [Wang, J.]NOVITAS, Nanoelectronics Centre of Excellence, School of Electrical and Electronic Engineering, Nanyang Technological University, Singapore, 639798, Singapore
  • [ 2 ] [Wang, J.]Wintech Nano-Technology Services Private Limited, Singapore, 117684, Singapore
  • [ 3 ] [Wang, X.]College of Physics and Information Engineering, Institute of Micro-Nano Devices and Solar Cells, Fuzhou University, Fuzhou, 350108, China
  • [ 4 ] [Lee, S.W.]NOVITAS, Nanoelectronics Centre of Excellence, School of Electrical and Electronic Engineering, Nanyang Technological University, Singapore, 639798, Singapore
  • [ 5 ] [Zhang, Q.]NOVITAS, Nanoelectronics Centre of Excellence, School of Electrical and Electronic Engineering, Nanyang Technological University, Singapore, 639798, Singapore

Reprint 's Address:

  • [Zhang, Q.]NOVITAS, Nanoelectronics Centre of Excellence, School of Electrical and Electronic Engineering, Nanyang Technological UniversitySingapore

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Source :

ACS Applied Materials and Interfaces

ISSN: 1944-8244

Year: 2019

Issue: 43

Volume: 11

Page: 40481-40489

8 . 7 5 8

JCR@2019

8 . 5 0 0

JCR@2023

ESI HC Threshold:236

JCR Journal Grade:1

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count:

30 Days PV: 1

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