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author:

Yu, J.L. (Yu, J.L..) [1] | Chen, Y.H. (Chen, Y.H..) [2] | Bo, X. (Bo, X..) [3] | Jiang, C.Y. (Jiang, C.Y..) [4] | Ye, X.L. (Ye, X.L..) [5] | Wu, S.J. (Wu, S.J..) [6] | Gao, H.S. (Gao, H.S..) [7]

Indexed by:

EI

Abstract:

In-plane optical anisotropy (IPOA) in modulation-doped (001) GaAs/AlGaAs quantum wells (QWs) has been studied by reflectance difference spectroscopy (RDS). By changing the position of the δ-doping layer, we introduce an asymmetric potential into the quantum well system, which results in an additional IPOA. Compared to symmetrically doped and undoped structure, the asymmetrically doped QWs exhibit larger IPOA, which is clearly demonstrated both by the RDS results measured at 80 K and the linear extrapolation of the RDS signal under uniaxial strain measured at room temperature. Numerical calculations within the envelope function framework show that the asymmetric potential induced by asymmetrically doping will introduce additional hole-mixing coefficients. This work demonstrates that the IPOA of QWs can be tailored by changing the delta-doping position. © 2013 American Institute of Physics.

Keyword:

Gallium arsenide III-V semiconductors Optical anisotropy Reflection Semiconducting gallium Semiconductor quantum wells

Community:

  • [ 1 ] [Yu, J.L.]Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, P.O. Box 912, Beijing 100083, China
  • [ 2 ] [Yu, J.L.]College of Physics and Information Engineering, Institute of Micro/Nano Devices and Solar Cells, Fuzhou University, Fuzhou 350108, Fujian Province, China
  • [ 3 ] [Chen, Y.H.]Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, P.O. Box 912, Beijing 100083, China
  • [ 4 ] [Bo, X.]Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, P.O. Box 912, Beijing 100083, China
  • [ 5 ] [Jiang, C.Y.]Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, P.O. Box 912, Beijing 100083, China
  • [ 6 ] [Ye, X.L.]Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, P.O. Box 912, Beijing 100083, China
  • [ 7 ] [Wu, S.J.]Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, P.O. Box 912, Beijing 100083, China
  • [ 8 ] [Gao, H.S.]Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, P.O. Box 912, Beijing 100083, China

Reprint 's Address:

  • [yu, j.l.]key laboratory of semiconductor materials science, institute of semiconductors, chinese academy of sciences, p.o. box 912, beijing 100083, china;;[yu, j.l.]college of physics and information engineering, institute of micro/nano devices and solar cells, fuzhou university, fuzhou 350108, fujian province, china

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Source :

Journal of Applied Physics

ISSN: 0021-8979

Year: 2013

Issue: 8

Volume: 113

2 . 1 8 5

JCR@2013

2 . 7 0 0

JCR@2023

JCR Journal Grade:2

CAS Journal Grade:3

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count: 4

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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