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author:

Liu, Yang (Liu, Yang.) [1] | Li, Fushan (Li, Fushan.) [2] | Perumal Veeramalai, Chandrasekar (Perumal Veeramalai, Chandrasekar.) [3] | Chen, Wei (Chen, Wei.) [4] | Guo, Tailiang (Guo, Tailiang.) [5] | Wu, Chaoxing (Wu, Chaoxing.) [6] | Kim, Tae Whan (Kim, Tae Whan.) [7]

Indexed by:

EI

Abstract:

Hybrid perovskite CH3NH3PbI3 has attracted extensive research interests in optoelectronic devices in recent years. Herein an inkjet printing method has been employed to deposit a perovskite CH3NH3PbI3 layer. By choosing the proper solvent and controlling the crystal growth rate, hybrid perovskite CH3NH3PbI3 nanowires, microwires, a network, and islands were synthesized by means of inkjet printing. Electrode-gap-electrode lateral-structured photodetectors were fabricated with these different crystals, of which a hybrid perovskite microwire-based photodetector would balance the uniformity and low defects to obtain a switching ratio of 16000%, responsivity of 1.2 A/W, and normalized detectivity of 2.39 × 1012 Jones at a light power density of 0.1 mW/cm2. Furthermore, the hybrid perovskite microwire-based photodetector arrays were fabricated and applied in an imaging sensor, from which the clear mapping of the light source signal was successfully obtained. This work paves the way for the realization of low-cost, solution-processed, and high-performance hybrid perovskite-based photodetector arrays. © 2017 American Chemical Society.

Keyword:

Electrodes Growth rate Ink jet printing Light sources Perovskite Photodetectors Photons

Community:

  • [ 1 ] [Liu, Yang]Institute of Optoelectronic Technology, Fuzhou University, Fuzhou; 350002, China
  • [ 2 ] [Li, Fushan]Institute of Optoelectronic Technology, Fuzhou University, Fuzhou; 350002, China
  • [ 3 ] [Perumal Veeramalai, Chandrasekar]Institute of Optoelectronic Technology, Fuzhou University, Fuzhou; 350002, China
  • [ 4 ] [Chen, Wei]Institute of Optoelectronic Technology, Fuzhou University, Fuzhou; 350002, China
  • [ 5 ] [Guo, Tailiang]Institute of Optoelectronic Technology, Fuzhou University, Fuzhou; 350002, China
  • [ 6 ] [Wu, Chaoxing]Department of Electronic Engineering, Hanyang University, Seoul; 133-791, Korea, Republic of
  • [ 7 ] [Kim, Tae Whan]Department of Electronic Engineering, Hanyang University, Seoul; 133-791, Korea, Republic of

Reprint 's Address:

  • [li, fushan]institute of optoelectronic technology, fuzhou university, fuzhou; 350002, china

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Source :

ACS Applied Materials and Interfaces

ISSN: 1944-8244

Year: 2017

Issue: 13

Volume: 9

Page: 11662-11668

8 . 0 9 7

JCR@2017

8 . 5 0 0

JCR@2023

ESI HC Threshold:306

JCR Journal Grade:1

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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