This　article　presents　a　comprehensive　review　about　the　current　research　activities　on　colloidal　lithography,　a　highly　efficient　technology　for　fabricating　large-area　patterned　functional　nanostructures.　Three　aspects　are　elaborated:　i)　self-assembly　of　monolayer　of　colloidal　crystals　(MCCs)　and　their　modifications;　ii)　lithographic　patterning　methods,　including　deposition　and　patterning　of　functional　materials　and　pattern　transfer　onto　the　underlying　substrates;　iii)　promising　applications,　especially　in　the　optical　and　photonic-related　fields　in　the　past　several　years.　Finally,　perspectives　on　the　current　challenges　and　future　trends　in　this　area　are　given.　The　present　review　intends　to　inspire　more　ingenious　designs　and　exciting　research　in　colloidal　lithography　for　advanced　nanofabrication.　©　2018　Elsevier　Ltd