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Fabrication and electrical characteristics of carbon nanotube-based microcathodes for use in a parallel electron-beam lithography sy...
This article presents an overview of the "Nanolith" parallel electron-beam (e-beam) lithography approach. The e-beam writing head consists of an array o...
文献获取Numerical analysis of thermo-mechanical reliability of through silicon vias (TSVs) and solder interconnects in 3-dimensional integra...
Three-dimensional integrated circuit (3D IC) is a promising technology in today's IC packaging industry. Since the technology is in infancy stages, many...
A new approach to high fidelity e‐beam and ion‐beam lithography based on an in situ global‐fiducial grid
The distortion‐free scan field of an electron‐beam or ion‐beam lithography system is generally quite small (10×10beam addresses) and hence to achiev...
Novel Approach for Fabrication of Single-Crystalline Insulator/Si/Insulator Nanostructures
Double-barrier insulator/Si/insulator nanostructures on Si(111) were prepared using molecular beam epitaxy. Ultrathin single-crystalline Si buried in a ...
Phase-shifting mask fabrication
The choice of a fabrication technique for phase-shifting masks is described by comparing approaches in which the shifter patterns are defined by etching...
Advanced nanoscale material processing with focused ion beams
We present an approach for the generation of metallic Ga dots and In nano-crystallites which, in contrast to conventional bottom-up or top-down processe...
Molecular Nanoelectronics
In this chapter we intend to discuss the major trends in the evolution of microelectronics and its eventual transition to nanoelectronics. As it is well...
Subwavelength plasmonics for graded-index optics on a chip
Planar plasmonic devices are becoming attractive for myriad applications, owing to their potential compatibility with standard microelectronics technolo...
Subwavelength plasmonics for graded-index optics on a chip.
Planar plasmonic devices are becoming attractive for myriad applications, owing to their potential compatibility with standard microelectronics technolo...
An overview of the application of atomic layer deposition process for lithium‐ion based batteries
Summary Abstract Lithium‐ion battery (LIB) systems provide a very promising range of power supply systems for diverse applications like electric vehicl...
